Tuning Metasurface Dimensions by Soft Nanoimprint Lithography and Reactive Ion Etching

Metasurfaces are ultrathin and flat layers of subwavelength nanostructures composed metallic or high‐refractive‐index materials. They can alter lightwave properties effectively show significant application potential in various nanophotonic technologies. The meta‐atoms generally carved by electron beam lithography focused ion beam. It is challenging to produce large‐scale metasurface devices at low cost. Herein, the fabrication low‐cost large‐area plasmonic dielectric metasurfaces through a combination soft nanoimprint reactive etching reported dimension controlling condition carefully implementing an iterative imprint etch process tuned. Such approach effective resonances reproduce new structures with minimum cost for wafer‐scale nanophotonics.